■ 특징
-High Efficiency, Uniform Exposure System with 300~450nm
-Uniform, Lightsource System
-Near UV Versions
-Hi-Reliability, Low Maintenance Design
■ 규격
1 ) Standard Features
- Manual alignment and Exposure system
- Manual Load and Unload
- Manual Alignment Mode
- Beam size :250x250mm
- glass Stage : X,Y,Z and theta Axis
- Tilted wafer stage
- Exposure mode; soft contact, vacuum contact
- UV Power Supply
- cooling unit for lamp
-Double CCD zoom microscope and 20" LCD Monitor
- Oil-less Vacuum Pump
2) System Specification
① Light Source Module
-UV power supply
- Wavelength : NUV
- Intensity : > 8 mw/cm2
- Max. Beam Size : 250x250mm
- Beam Uniformity :less than5 %
② DualCCD Microscope Module
-motorized moving stage : X, Y, Z Axis
- Moving Distance
- 400X magnification
- Objective separation : 60 mm
- Y-Axis: 10mm
- Magnification: 400X, WD: 60mm
- 20" LCD Monitor
- Dual optic coaxial illumination
③ Stage Module
- Stage Moving Distance
- X, Y Axis : 20 mm
- Z Axis : 25 mm
- Theta Axis: 4 degree
- Stage Resolution
- X, Y Stage Resolution: 1㎛
- Theta : 0.1 degree
- Z Axis : 10㎛
- Align accuracy : <± 2 um
- tilt stage
④ Resolution
- Vacuum Contact : 10 um ( photoresist 1um thickness@Si Wafer )
- Proximaty: 30 um
⑤ Utility
- Dimension(mm) : 1,400mm*1200mm*1400mm[W*D*H]
- Electric Power : 220V,50Amp, 50/60Hz, 1 Phase
- Air : More than 5kg/cm2
- Flow rate 50 Liter/min
- Out side diameter 6 mm Tube
- Vacuum: =600mmHg, ( Vacuum pump included )
- Exhaust: Lamp House Cooling
- Flow rate 10 Liter/min
- Weight : Equipment : 250 kg
용도 :MEMS ,LithoGraphy..
납품처 :인하대, 가천대, 시립대, NST,경남대,순천향대 외 다수업체 |
