MASKLESS LITHOGRAPHY SYSTEM 폴로스 마이크로 프린터/POLOS μPrinter Home

MASKLESS LITHOGRAPHY SYSTEM POLOS μPrinter(polos micro printer, 마이크로 프린터)

The POLOS μPrinter is a maskless lithography equipment for rapid-prororyping,
(Polos 마스크리스 리소그래피 시스템, 빠른 프로토 타입 제작 가능)

based on a μLCD projection technology, compatible with a wide range of resists and substrates.

-하드마스크를 제작할 필요없이 캐드도면을 웨이퍼나 글래스에 바로 노광하는 방식

Our system can produce any 2D shapes at micron resolution without the need for a hard-mask.
- 하드 마스크 제작 없이 마이크론 단위의 노광 가능

Key features

-라이팅 해상도 >2 μm

-Adjustable writing field and resolution with exchangeable objectives

Compatible with CAD files or bitmap images

Compatible with g-line photoresists

Compatible with a wide range of substrates (silicon, glass, metal, plastic, ... )

Compatible with any sample size up to 4” wafer Camera feedback for alignment steps

Key benefits

Time and money saving due to the absence of a hard-mask

lntuitive alignment method with direct overlay of the design on the sample

Table-top with very small foot print

Technology well suited for microelectronics, 2D-materials, microfluidics, optoelectronics, opties or any other 2D microfabrication application

MASKLESS LITHOGRAPHY SYSTEM POLOS μPrinter(polos micro printer, 마이크로 프린터)

SPECIFICATIONS (polos micro printer, 마이크로 프린터)

Microfabrication system

Light source	^{Exposure: 435 nm; alignment: 525 nm}
Minimum feature size	^{Adjustable from 2 to 23 μm}
Alignment resolution	^{Down to 1 μm/cm}2
Maximum exposure area	^{75 x75 mm}2
Substrate size	^{Up to 4” wafers}
System dimensions	^{W: (36 cm); D: (36 cm); H: (60 cm)}

Software package

All-in-one PC	^{With Win 10, 24" full HD}
SFTprint software	^{Machine control, step-and-repeat, automatic dose test, stitching, alignment}
SFTconverter	^{Convertion of standard formats (gdsii, dxf, cif, oas) to bitmap images. CAD software included}

Options and accessories Multiple-sample holder (glass-slide, 4” water, ... )
Objectives (see below) Manual or motorized Z stage with tilt correction Manual rotation stage (360°)

Objective	^1X	^2.5X	^5X	^10X
Writing field (mm)	^{13.6 x 7.7}	^{5.4 x 3.0}	^{2.7x 1.5}	^{1.35 x 0.75}
Smallest feature (μm)	²³	⁸	⁴	²