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À缺ITS´Â ¹ÝµµÃ¼°ü·Ã Àåºñ Á¦ÀÛ¹× ¼öÀÔ ÆÇ¸Å¾÷üÀÔ´Ï´Ù.

 

Spin Process Station:스핀프로세스 스테이션 (¿¡Äª, µðº§·ÎÇÎ,Ŭ¸®´×&µå¶óÀ×) Spin Cleaning & Spin Drying

JS-12EDR : ½ºÇÉ ÇÁ·Î¼¼¼­ ( ¼¼Á¤ , ½Ä°¢¿ë ,Ŭ¸®´×, µðº§·ÎÇÎ ¿ë)

- ¿ëµµ : ºÒ»ê È¥ÇÕ»ê ¿¡Äª, ¼¼Á¤¿ë , µðº§·ÎÇÎ, Ŭ¸®´×, µå¶óÀ×

1.Full Ç÷¡½ºÆ½ ÇÏ¿ì¡

2.Single wafer process, 6~12inch ,Á¶°¢ ¿þÀÌÆÛ

3.Manual loading and unloading system

4.Acid-resistant materials and structure

5.Time : 1-999 sec/step

6.Speed :1-2.000 rpm

7.Vacuum Chuck,or mechanical Chuck or Non contact wafer chuck

8.Etch uniformity: + - 3%

9.2-6 chemicals(Àü󸮿ë ,º»Ã³¸®¿ë ¿¡ÃµÆ®..),IPA, DIW rinse and N2 dry

Substrate Front & Back Side In Situ Di Water Rinse

10.Temperature control for chemicals

11.Chemical flow control

12.Spray swing arm movement(Option)

½ºÇÉŬ¸®´×, ½ºÇÉ µå¶óÀ×,½ºÇÉ¿¡Äª, ½ºÇÉ µð½ºÆæ½Ì

ÀÌÁö LCD control:

-½Ã°£ :0-999sec/step

-RPM:0-2000

-Valve¼±ÅÃ

 


1900Wx1200Dx1900H mm

Spin Process Station
 
Shop » Models » Stations

½ºÇÉ¿¡Ã³, ½ºÇɵå¶óÀ̾î, ½ºÇÉµðº§·ÎÆÛ, ½ºÇÉŬ¸®´×
  • Drying
  • Rinse/clean
  • Etching
  • Manual coating
  • Automatic coating
  • Developing

½ºÇÉ ÇÁ·Î¼¼¼­ ½Ã½ºÅÛ

[Àåºñ »ç¾ç]

½ºÀ®¾ÏÇü(or ¸®´Ï¾î¾Ï ŸÀÔ)µð½ºÆæ¼­

[Feature]

- Substrate Size(Max.) : 100x100 ~200x200 MM (À¯Àú ÇùÀÇ °¡´É)

- Process step : 10 steps/ program,

- Memory Storage : 10 Programs

- Rotation Speed : 1 ~ 2500 rpm (`5,000 rpm for 6¡±)

- Acceleration ratio setup, Max. 10000RPM/sec. w/o load

- Run Time : 1~999sec,

[Specification]

- Body structure:Full Plastic

- Bowl :Full Plastic

Size :

Bowl Material : Full Plastic

- Swing Arm(or ¸®´Ï¾î¾Ï ŸÀÔ) dispenser

. ¿ÂµµÁ¶Àý °¡´É :0~60C

PR: ¾Ð·ÂÅÊÅ© °ø±Þ ¹æ½Ä

Çö»ó¾×: ¾Ð·ÂÆßÇÁ ¹æ½Ä

¼ø¼ö: »ç¿ëÀÚ °ø±ÞÁ¶°Ç

Valve: Å×ÇÁ·Ð, PFA

³ëÁñ ÅäÃâ(Dispensing)

³ëÁñ: Å×ÇÁ·Ð ¶Ç´Â PFA 3ea(PR, Developer, DI water)

 

- Spin Motor, driver:

Rotation Speed: 1 ~ 3,000 rpm (±âÆÇ »çÀÌÁî¿¡ µû¶ó °¡°¨ °¡´É)

Spin accuracy: 1RPM @Max. RPM

Spin chuck UP/DOWN

- System Controller: Digital Type, PLC,or ¼öµ¿Çü

- Display: LCD Touch Panel or¼öµ¿ Á¶ÀÛ

 

- Accuracy : ¡¾1 RPM

 

- ³»ºÎ LED Á¶¸í

- »óÃø ÇìÆÄÇÊÅÍ À¯´Ö :¿É¼Ç

- Drain:1~ 4 ports

Drain Bottle: PP 18 L

Dispensing nozzle: 1/8¡±~ 1/4¡± PFA tube end

Drain full level sensor

- Power Input : 1 phase, AC 220V, 50/60Hz

- Dimension (W X D X H) :

Á¤¸é À¯¸® µµ¾î

Vacuum Chuck Æ÷ÇÔ

Alignment tool Æ÷ÇÔ (wafer centering tool)

 

Utility

- Exhaust: 100A, 1 port

- N2: 2~3 Kg/cm2, 3/8¡± SWGLOK

- CDA: 5 Kg/ cm2 ÀÌ»ó

- Electricity: 1 phase, AC 110/220V

Mask Cleaner

¹ÝÀÚµ¿Çü
¸¶½ºÅ© ¾ó¶óÀ̳Ê

ÆòÇ౤ ³ë±¤±â

»ç°¢ ±âÆÇ¿ë
ÆòÇ౤ ³ë±¤±â

ALD System(Atomic Layer Deposition)

espro Flowmeter

 

½ºÇÉÄÚÅÍ/Spincoater 4Æ÷ÀÎÆ®ÇÁ·Îºê/4PointProbe ¸¶½ºÅ©¾ó¶óÀ̳Ê/MaskAligner ¼±ÇϾßÅä/Sunhayato PCB Á¦À۽ýºÅÛ
ÆÄ¸±·»ÄÚÅÍ/Parylenecoater ¿¡Ã³/Ä¿ÅÍ



À缺ITS co,
Tel:031-479-4211/2
Mail: contrabase26@gmail.com     jsi@jsits.com
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