½ºÇÉÄÚÅÍ(Spincoater)

¸¶½ºÅ©¾ó¶óÀ̳Ê(Mask Aligner)

 
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Spin Processing System
               
Spin Processor   Spin Etcher   Spin Developer  EBR(Edge Bead Removal)  SpinDryer   SpinCoater
               
               
 
Spin Processor(½ºÇÉÇÁ·Î¼¼¼­)
     
 

Spin Processor

Spin Etcher

Spin Developer

EBR(Edge Bead Removal)

 

½ºÇÉÇÁ·Î¼¼½º ½ºÅ×À̼Ç:
( Spin Process Station for Etching & Cleaning )
¼¼Á¤(½Ä°¢), Ŭ¸®´×, µå¶óÀ×     

Fully integrated cabinet for safe and clean etching or developing process

 

 

spin processor

Spin process Station JS-84EDR : 8ÀÎÄ¡ ½ºÇÉÇÁ·Î¼¼½º ½ºÅ×À̼Ç

-Manual loading unloading Dispensing Drying system
-Full Plastic Housing
- 4 Chemicals Etching , DI-Water Rinsing ,Spin Drying
-Temperature Control for Chemicls (0~70C)
-Max Substrate :ÃÖ´ë 200 MM ,300mm,500mm(¼±ÅÃ)
-Speed :1~2,000rpm RPM,
-Fixed dispencing spraying nozzles
-Chemical resistant bowl(PTFE) ,and Bath
-Chemical Flow Rate control by flow meters
-N2 or Clean air Dry Dispensor Nozzle
- 8" Chuck , 3cm x 3cm Chuck
-4 Dispensing ¿ë Tubing ,Nozzle( Bath with Heating System :»ó¿Â ~70C)
acid, alkali, organic solvent, organic solvent¿ë
-DI-Water Rinsing Line :Áß¾Ó °ø±Þ ¶óÀοë
-Nozzle Type : dispensing Type
-Programmable :Unlimited
-automatic chemical dispense, heavy duty motor, including:
- Touchscreen with Customisable Icons ,USB Port
- 1" Drainconnection
-Timer:0-999 seconds
-Tranaparent window
-Programmable Process Control for Speed, Time and step..Valve
- Dimension :1600Wx1000Dx1800H mm

 

 

spin-etcher  
spin-dispenser  

Fully integrated cabinet with double spin chambers for safe and clean coating & developing process

 

 

Coater equipped with:

  • Fully automated dosing pump
  • Dynamic movable dispense arm with constant or Rpm related speed control for maximum uniformity among whole substrate surface
  • Front and back side adjustable Edge Bead Removal
  • Nitrogen dry :optionally available through lid or movable arm
  • Digitally controlled brushless motor with highly accurate speed control and acceleration selectable per recipe step
   

 

 

Developer equipped with:

  • Fully automated top spray developing system with double contained lines
  • HD drive suitable for chemical saver “puddle” developing
  • Developer dispensed through dispense vessel
  • Substrate Front & Back Side In Situ Di Water Rinse with manually adjustable flow rate
  • Combined chamber rinse and purge system for safe access to process chamber
  • Selectable drain line with integrated drain canister for waste collecting

 

 

See also our other models:

Cleaning

Etching

 

Spin Process Station
 
Shop » Models » StationsÅ©¸®´× & µå¶óÀÌ¿ë ½ºÇÉÇÁ·Î¼¼¼­


 

 

     

Compact integrated solution in single cabinet:

  • Full Ç÷¡½ºÆ½ ÇÏ¿ì¡ :10mm Thick NPP
  • ÀÌÁö ÇÁ·Î¼¼½º ÄÜÆ®·ÑÀÌ °¡´ÉÇÑ Åõ¸í ÇÑ ¶Ñ²±
  • DI-water and Nitrogen spray Nozzle Located in
  • °³½º ´©Ãâ¹æÁö ¼³°èÀû¿ë
 

 

SpinDryer

SpinCoater

 

 

Coater equipped with:

  • Fully automated dosing pump
  • Dynamic movable dispense arm with constant or Rpm related speed control for maximum uniformity among whole substrate surface
  • Nitrogen dry :optionally available through lid or movable arm
  • Digitally controlled brushless motor with highly accurate speed control and acceleration selectable per recipe step
   

Portable Wand

Vacuum Wand Set

Vacuum tips

Vacuum Handles

     

Wafer 3-point mechanical gripper

Wafer Edge Pick

Applications:

  • Drying
  • Rinse/clean
  • Etching
  • Manual coating
  • Automatic coating
  • Developing

 

 

Aluminum Process Cassettes

Aluminum Box Cassettes

Stainless Steel Process Cassettes

Process Cassettes 300mm

     

Mask Pick - Side Grip

Mask Pick - Horizontal Grip

   
     

Manual Reticle SMIF Pod Opener, RSP150

Manual FOUP Opener, 300 mm

   
     

Automatic Wafer Presenter

Manual Five-Wafer Lift Presenter

Manual Single Wafer Presenter

21-manual-wafer-escalators

   
 


À缺ITS co.

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 Tel : (031) 479-4211/2, Fax : (0504) 460-0288

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