½ºÇÉÄÚÅÍ(Spincoater)

¸¶½ºÅ©¾ó¶óÀ̳Ê(Mask Aligner)

 
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Spin Processing System
               
Spin Processor   Spin Etcher   Spin Developer  EBR(Edge Bead Removal)  SpinDryer   SpinCoater
               
               
 
Spin Processor
     
 

Spin Processor

Spin Etcher

Spin Developer

EBR(Edge Bead Removal)

 

½ºÇÉ µðº§·ÎÆÛ(Spin Developer):
(Spin Developer ) µðº§·ÎÇÎ
,¸°½Ì,µå¶óÀ×     

Fully integrated cabinet for safe and clean etching or developing process

spin-rinse-dryer

Jsi-6060DD ´ëÇü ½ºÇÉ µðº§·ÎÆÛ SpinDeveloper
ÅÍÄ¡ÆгΠPLC ÇÁ·Î±×·¡¹Ö ŸÀÔ

-Body structure: AL profile
-Body & Bowl :SUS,PVC
-Bowl Size : 900 mm dia. Bowl, PP
-¹Ù´Ú Bowl Material : SUS 304
-Max Substrate :ÃÖ´ë 610mm x 610mm : 200 MM ,300mm, 500mm(¼±ÅÃ)
-Rotation Speed :150~1,500rpm RPM
-Spin Acuracy :+-0.5%,
-Step :PLC Programming ,10 step, ,10 Memoriy ±â´É
- Auto Swing Nozzle Arm Type ,
-Timer:0-999 seconds
-PR Coating, Diveloping Di-Water Rinsing ±â´É
- 3 Dispensing Line (PR Coating , Developing , Di Water Rinsing
-Dispensing nozzle: 1/8¡±~1/4¡± PFA tube's end Chemical valve »ç¿ë
- 3 Bottle ( 10¸®ÅÍ x3)
Pressure tank for bottle : photoresist,Developer,Di-Water, SUS304
-Drain : Drain Bottle: PP 18 L
-±âº» Chuck Æ÷ÇÔ : À¯Àú¿Í ÇùÀÇÇÏ¿¡ Á¦ÀÛ
-¾Ë¹Ì´½ ±¸Á¶¹°¿¡ ¾ÈÂø, Á¤¸é À¯¸® µµ¾î
-Dry Vacuum pump ( 100L/ min) Æ÷ÇÔ
Utility
-Exhaust: 125A, 1 port, ¼öµ¿
-CDA: 5 Kg/ cm2 ÀÌ»ó
-Electricity; 1 phase, 220V, 20A
Dimension : 1400w*1200h*1700d mm
¿ëµµ:,±Û¶ó½º PR ÄÚÆà ,µðº§·ÎÇÎ , ¸°½Ì,

 

 

   
   

 

 

 

See also our other models:

Cleaning

Etching

 

Spin Process Station
 
Shop » Models » StationsÅ©¸®´× & µå¶óÀÌ¿ë ½ºÇÉÇÁ·Î¼¼¼­


 

 

     

Compact integrated solution in single cabinet:

  • Full Ç÷¡½ºÆ½ ÇÏ¿ì¡ :10mm Thick NPP or PVC
  • ÀÌÁö ÇÁ·Î¼¼½º ÄÜÆ®·ÑÀÌ °¡´ÉÇÑ Åõ¸í ÇÑ À©µµ¿ì
 

 

SpinDryer

SpinCoater

 

 

Coater equipped with:

  • Fully automated dosing pump
  • Dynamic movable dispense arm with constant or Rpm related speed control for maximum uniformity among whole substrate surface
  • Nitrogen dry :optionally available through lid or movable arm
  • Digitally controlled brushless motor with highly accurate speed control and acceleration selectable per recipe step
   

Portable Wand

Vacuum Wand Set

Vacuum tips

Vacuum Handles

     

Wafer 3-point mechanical gripper

Wafer Edge Pick

Applications:

  • Drying
  • Rinse/clean
  • Etching
  • Manual coating
  • Automatic coating
  • Developing

 

 

Aluminum Process Cassettes

Aluminum Box Cassettes

Stainless Steel Process Cassettes

Process Cassettes 300mm

     

Mask Pick - Side Grip

Mask Pick - Horizontal Grip

   
     

Manual Reticle SMIF Pod Opener, RSP150

Manual FOUP Opener, 300 mm

   
     

Automatic Wafer Presenter

Manual Five-Wafer Lift Presenter

Manual Single Wafer Presenter

21-manual-wafer-escalators

   
 


À缺ITS co.

°æ±âµµ ¾È¾ç½Ã µ¿¾È±¸ È£°è 555-9 ¾È¾ç ±¹Á¦ À¯Åë´ÜÁö 17µ¿ 127È£
 Tel : (031) 479-4211/2, Fax : (0504) 460-0288

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