ALD (Atomic Layer Deposition)
 
               
 

ALD systems and equipment for research to pilot lines, from thermal ALD equipment to plasma ALD equipment.
Shop by size and capability, or compare our systems using the button below.


 
           
           
               
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AT200M
AT410
AT650P
AT650T
AT-OZONE Generator
AT610
AT810

 

             
 

Anric Technologies´Â ½ÃÀå¿¡¼­ °¡Àå ÀÛÀº Å©±âÀÇ ALD(¿øÀÚÃþ ÁõÂø) µµ±¸ÀÔ´Ï´Ù.
AT200MÀº ±Û·Îºê¹Ú½º¿¡ µé¾î°¥ ¸¸Å­ À۱⠶§¹®¿¡ ½À±â³ª °ø±â¿¡ ¹Î°¨ÇÑ ÁõÂøÀ» À§ÇÑ ¿Ïº®ÇÑ ¼Ö·ç¼ÇÀÔ´Ï´Ù.

ÀÛÀº ¼³Ä¡ °ø°£(~ 15in3 ¶Ç´Â 38.1cm3)
Àü±¸Ã¼ 1°³¿Í ¿ª¹ÝÀÀ¹° 1°³(4Æ÷Æ® ¿É¼Çµµ »ç¿ë °¡´É)
¹ÝµµÃ¼ µî±Þ ºÎÇ°
±Ý¼Ó ¹ÐºÀ ¶óÀÎ
ÅëdzÇü Àü±¸Ã¼ ¿£Å¬·ÎÀú
ÅëÇÕµÈ ºÒÈ°¼º °¡½º ÆÛÁö¸¦ À§ÇÑ ÃÊ°í¼Ó MFC¸¦ °®Ãá °í¿Â ȣȯ, °í¼Ó ÆÞ½º ALD ¹ëºê
Àü±¸Ã¼(ÃÖ´ë 150¡ÆC), ¸Å´ÏÆúµå, ÀÀÃà ¹æÁö¸¦ À§ÇØ °¡¿­µÈ è¹ö.
°ß°íÇÑ PLC ±â¹Ý »ç¿ëÀÚ ÀÎÅÍÆäÀ̽º
½ºÅ×Àη¹½º ½ºÆ¿ è¹ö´Â 300¡ÆC±îÁö °¡¿­µÉ ¼ö ÀÖ½À´Ï´Ù.

 

 

AT200M

     
AT200M(±Û·¯ºê¹Ú½º¿¡ µé¾î°¥ ¸¸Å­ ÀÛÀº Å©±â)Àº ½ÃÁß¿¡¼­ ±¸ÀÔÇÒ ¼ö ÀÖ´Â °¡Àå ÀÛÀº Å©±âÀÇ ALD(¿øÀÚÃþ ÁõÂø) ½Ã½ºÅÛÀÔ´Ï´Ù.
     

AT200M-precursor-Ãø¸é-2380-by-2342

AT200M-Èĸé-2424-by-2342

Options-for-AT200M-cropped-79x80

Àåºñ Ư¡
ÀÛÀº ¼³Ä¡ °ø°£(~ 15in3 ¶Ç´Â 38.1cm3)À¸·Î ±Û·Îºê¹Ú½º³ª SEM/TEM¿ë Áõ¹ß±â ¿·¿¡ ½±°Ô µé¾î°¥ ¼ö ÀÖ½À´Ï´Ù.
ÇϳªÀÇ Àü±¸Ã¼¿Í ÇϳªÀÇ ¿ª¹ÝÀÀ¹°
ÅëdzÇü Àü±¸Ã¼ ¿£Å¬·ÎÀú
ÅëÇÕµÈ ºÒÈ°¼º °¡½º ÆÛÁö¸¦ À§ÇÑ ÃÊ°í¼Ó MFC¸¦ °®Ãá °í¿Â ȣȯ, °í¼Ó ÆÞ½º ALD ¹ëºê - Ç¥ÁØ
±Ý¼Ó ¹ÐºÀ ¶óÀÎ
Àü±¸Ã¼(ÃÖ´ë 150¡ÆC), ¸Å´ÏÆúµå, ÀÀÃà ¹æÁö¸¦ À§ÇØ °¡¿­µÈ è¹ö.
½ºÅ×Àη¹½º ½ºÆ¿ è¹ö´Â 300¡ÆC±îÁö °¡¿­µÉ ¼ö ÀÖ½À´Ï´Ù.
ÅëÇÕ PLC ÄÁÆ®·Ñ·¯°¡ Æ÷ÇÔµÈ 5¡È µð½ºÇ÷¹ÀÌ(PC ÇÊ¿ä ¾øÀ½)
Àåºñ ½ºÆå
½Ç¿Â ~ 300¡ÆC ¡¾ 1¡ÆCÀÇ Ã¨¹ö ¿Âµµ
RT ~ 150¡ÆC ¡¾ 2¡ÆCÀÇ Àü±¸Ã¼ ¿Âµµ(°¡¿­ ÀçŶ Æ÷ÇÔ)
½ÃÀå¿¡¼­ °¡Àå ÀÛÀº ¼³Ä¡ °ø°£(1.6Æò¹æÇÇÆ®), º¥Ä¡Å¾ ¼³Ä¡, Ŭ¸°·ë ȣȯ, ±Û·Îºê¹Ú½º¿¡µµ ÀûÇÕÇÕ´Ï´Ù.
½Ã½ºÅÛ À¯Áö °ü¸®°¡ °£´ÜÇÏ°í À¯Æ¿¸®Æ¼ ¹× Àü±¸Ã¼ »ç¿ë·®ÀÌ Àû½À´Ï´Ù.
ÀÛÀº è¹ö º¼·ý
¸Å¿ì ºü¸¥ »çÀÌŬ¸µ ±â´É.
´ÙÁß »ç¿ëÀÚ È¯°æ¿¡¼­µµ ¾ÈÀüÇÑ ¿î¿µÀ» À§ÇÑ Full HW, SW ¿¬µ¿
Àåºñ ¿É¼Ç
±Û·Îºê¹Ú½º ÅëÇÕÀÌ ÇÊ¿äÇÏÁö ¾Ê½À´Ï´Ù. [±Û·Îºê¹Ú½º¿¡ ¸Â½À´Ï´Ù.]
¸ÂÃãÇü ô/°¡¾ÐÆÇ(»ç°¢Çü, ¿øÇü, ÀÌÁß ±âÆÇ, ¹Ù½ºÄÏ, ÀÛÀº Á¶°¢, µÎ²¨¿î ±âÆÇ).
ATOzone ? ¿ÀÁ¸ ¹ß»ý±â(ÀϺΠÇʸ§¿¡ ÇÊ¿ä: Pt, Ir, SiO 2 , MoO 2 , 60¡ÆC ¹Ì¸¸ÀÇ °íÇ°Áú Al 2 O 3 , °íÇ°Áú HfO 2 )
¿É¼Ç - ÁÖº¯ ¿ÀÁ¸ °¡½º¸¦ ½Ç½Ã°£À¸·Î °¨ÁöÇÏ´Â ¿ÀÁ¸ ¾ÈÀü ¸ð´ÏÅÍ
4 Æ÷Æ® ¿É¼Ç(¿¹: °¡¿­µÈ Àü±¸Ã¼ 2°³, °¡¿­µÇÁö ¾ÊÀº Àü±¸Ã¼ 1°³, ¿ª¹ÝÀÀ¹° 1°³)
ºÐ¸» ÄÚÆà µå·³
¿ÜºÎ Á¦¾î ? PC/¼ÒÇÁÆ®¿þ¾î ¸µÅ©(¿ø°Ý ÇÁ·Î±×·¡¹Ö ¹× ½ÇÇà °¡´É)
Åëdz °¡´ÉÇÑ Àü±¸Ã¼ ijºñ´Ö Æ÷ÇÔ
¿¹ºñ è¹ö
¼³Ä¡½Ã ÂüÁ¶»çÇ×
ÀÚ¼¼ÇÑ ÁöħÀº " AT200M ¼³Ä¡ ¹× ½ÃÀÛ " ÁöħÀ» ÂüÁ¶ÇϽʽÿÀ.
N 2 ÆÛÁö °¡½º´Â Â÷´Ü ¹ëºê(10 ? 30 psi·Î Á¶Àý, ±Ý¼Ó ¹ÐºÀ)¸¦ »ç¿ëÇÏ¿© >99.9995%¿©¾ß ÇÕ´Ï´Ù.
1/4¡È ±Ý¼Ó ¹ÐºÀ ¶óÀÎÀ» ÅëÇØ Áú¼Ò(UHP) ÆÛÁö °¡½º¸¦ µÞ¸éÀÇ 1/4¡È ¾ÐÃà ÇÇÆÿ¡ ¿¬°áÇÕ´Ï´Ù.
1/4ÀÎÄ¡ Æú¸®¿¡Æ¿·» Æ©ºê³ª ±Ý¼Ó ¶óÀÎÀ» ÅëÇØ 90-110psi CDA(±ú²ýÇÏ°í °ÇÁ¶ÇÑ °ø±â)¸¦ ´Ù¸¥ 1/4ÀÎÄ¡ ¾ÐÃà ÇÇÆÿ¡ ¿¬°áÇÕ´Ï´Ù.
ÀûÀýÇÑ 1¡È Áø°ø(±Ý¼Ó(SS) ¼±È£) È£½º(KF25), O-¸µ ¹× Ŭ·¥ÇÁ¸¦ »ç¿ëÇÏ¿© ÆßÇÁ¸¦ ºÎÂøÇÕ´Ï´Ù.
Áø°ø ÆßÇÁÀÇ ´Ù¸¥ ÂÊ(¹è±â ÂÊ)(* Fomblin°ú °°Àº °úºÒ¼ÒÈ­ Áø°ø ¿ÀÀÏ ÇÊ¿ä)Àº > 5cfm µå·Î¿ì(1¡È Æ©ºêµµ)°¡ Àִ ǥÁØ ½ÇÇè½Ç ¹è±â ¶Ç´Â ÁöºØÀ¸·Î °¡¾ß ÇÕ´Ï´Ù.
1¹ÌÅͺ¸´Ù Å« °æ¿ì 1.5¡È(NW40)À» »ç¿ëÇØ¾ß ÇÕ´Ï´Ù.
¾ÏÇü VCR ¿¤º¸¿ì¸¦ ÅëÇØ Àü±¸Ã¼¸¦ ºÎÂøÇÕ´Ï´Ù(Ç×»ó »õ °³½ºÅ¶À» »ç¿ëÇϽʽÿÀ).
1/4¡È °³½ºÅ¶ ¸ÕÀú(Àå°© Âø¿ë)
Àü±¸Ã¼ ºÎÂø¿¡ ´ëÇؼ­´Â ¡°AT200M µµ±¸ ¹× ¼ÒÇÁÆ®¿þ¾î ÀÛµ¿¡±À» ÂüÁ¶ÇϽʽÿÀ.
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ÀÚ¼¼ÇÑ ÁöħÀº ÇÁ·¹Á¨Å×ÀÌ¼Ç ¹× ºñµð¿À ÁöħÀÎ " AT200M ¼³Ä¡ ¹× ½ÃÀÛ " À» ÂüÁ¶ÇϽʽÿÀ.

5ÀÎÄ¡ ÅÍÄ¡ ½ºÅ©¸°
ÆгÎÀ» °®Ãá HMI(Human Machine Interface) PLC ½Ã½ºÅÛ
Ç¥ÁØ ALD »çÀÌŬ ÁõÂø¿¡ ÀûÇÕÇÑ °í±Þ Á¦¾î
°íÇ°ÁúÀÇ Å×½ºÆ®µÈ ÇÁ·Î¼¼½º¸¦ À§ÇÑ ·¹½ÃÇÇ µ¥ÀÌÅͺ£À̽º
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3¿ø È­ÇÕ¹° ¹× ³ª³ë ÀûÃþü¸¦ À§ÇÑ ³»ÀåÇü ÆÞ½º ½ÃÄö½º
°£´ÜÇÑ Áú¹®À¸·Î ºü¸£°Ô ½ÇÇàÇÏ¿© »ç¿ëÀÚ¸¦ À¯µµÇÕ´Ï´Ù.
ÀÔ·Â ÇÏÀ§ ÁÖ±â ¹× Àüü ÁÖ±â

 

 

 

                 
 

ALD Systems Comparison

Compare ALD equipment and systems manufacturedAnric Technologies. Compare by size and capability.

 
                 
 
AT200M
AT410M/610/810
AT650T
AT650P
 
 
 
  Desktop (W: ~11¡± (27.9cm) x D: 15¡± (38.1cm) x H: 14.5¡± (36.8cm))   Desktop (W: 24.5¡± (62.3cm) x D: 24¡± (61cm) x H: 15.75¡± (40.5cm))[610 D: 25¡È (63.5cm)]   Desktop (W: 15¡± (38.1cm) x D: 15¡± (38.1cm) x H: Less that 38¡± (96.5cm))   Desktop (W: 15¡± (38.1cm) x D: 15¡± (38.1cm) x H: 38¡± (96.5cm))  
  Sample Size = 2 inch (x2) up to 2 x 2 x 2¡± volume   410 = 4 inch; 610 = 6 inch; 810 = 8 inch   6 inch   6 inch  
  Thermal to 300¡ÆC   Thermal to 320¡ÆC   Thermal to 400¡ÆC
(upgradeable to Plasma)
  Plasma and Thermal to
400¡ÆC
 
  One Precursor/One Counter
Reactant
  Three Precursors/ Up to Three Counter
Reactants
  Four Precursors/Four
Counter Reactants
  Four Precursors/Four
Counter Reactants
 
  Heated Precursor to 150¡ÆC   Heated Precursor to 180¡ÆC (N2 Assist Available)   3 Precursors to 185¡ÆC (with optional pressure boost) , 1 at RT   3 Precursors to 185¡ÆC (with optional pressure boost) , 1 at RT  
  All stainless steel chamber and metal sealed stainless lines   All aluminum chamber (hot walled) and metal sealed stainless lines   All aluminum chamber (warm walled) and metal sealed stainless lines and chuck   All aluminum chamber (warm walled) and metal sealed stainless lines and chuck  
  Heated lines and fast pulsing ALD valves   Heated lines and fast pulsing ALD valves   Heated lines and fast pulsing ALD valves   Heated lines and fast pulsing ALD valves  
  Ultrafast MFC   Ultrafast MFC   Up to four ultrafast MFCs   Up to four ultrafast MFCs  
  5¡± Display w. Integrated
PLC
  7¡° Display with integrated
PLC
  10¡° Display with integrated
PLC
  10¡° Display with integrated
PLC
 
                 

 

     
 

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