ALD (Atomic Layer Deposition) |
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ALD systems and equipment for research to pilot lines, from thermal ALD equipment to plasma ALD equipment. |
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Email :contrabase26@gmail.com |
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AT-OZONE Generator ¿ÀÁ¸, »ê¼Ò ¹× ²¨Áü À§Ä¡ °£ ¼öµ¿ ¶Ç´Â ÀÚµ¿ Àüȯ. ¿ÀÁ¸ »ý¼º ¹üÀ§: ÀúÀ¯·®¿¡¼ Áß·® ±âÁØ 12%, °íÀ¯·®¿¡¼ 6%.
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AT-OZONE Generator |
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ATOzone(¿ÀÁ¸ ¹ß»ý±â) ½Ã½ºÅÛÀº ¸Å¿ì ÀÛÀº ÇüÅ·Π°í³óµµ(ÃÖ´ë 12%) ¿ÀÁ¸À» Àü´ÞÇÏ´Â °íÇ°Áú ±¸¼º ¿ä¼Ò¸¦ »ç¿ëÇÕ´Ï´Ù. ÀÌ ½Ã½ºÅÛÀº ºñ½Î°í ºÎÇÇ°¡ Å« ¼ö³Ã½ÄÀ» ÇÊ¿ä·Î ÇÏÁö ¾Ê½À´Ï´Ù. ³»ÀåµÈ °í¼Ó ÆÒÀº Àå±â°£ ¶Ç´Â Áö¼ÓÀûÀ¸·Î »ç¿ëÇÏ´Â µ¿¾È¿¡µµ ÇöóÁ ¼¿À» ½Ã¿øÇÏ°Ô À¯ÁöÇÕ´Ï´Ù. |
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¿ÀÁ¸ »ý¼º ¹üÀ§: ÀúÀ¯·®¿¡¼ Áß·® ±âÁØ 12%, °íÀ¯·®¿¡¼ 6%. |
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¿ÀÁ¸ ¾ÈÀü ¸ð´ÏÅÍ AT ½Ã¸®Áî ½Ã½ºÅÛ°ú ¸ð´ÏÅ͸µ ¹× ÅëÇÕ |
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ÀÚ¼¼ÇÑ ÁöħÀº ÇÁ·¹Á¨Å×ÀÌ¼Ç ¹× ºñµð¿À ÁöħÀÎ " AT650T ¼³Ä¡ ¹× ½ÃÀÛ " À» ÂüÁ¶ÇϽʽÿÀ. 10ÀÎÄ¡ ÅÍÄ¡ ½ºÅ©¸° Ç¥ÁØ ALD »çÀÌŬ Àº ¹°·Ð ³ª³ë¶ó¹Ì³×ÀÌÆ®, µµÇÎµÈ ¹Ú¸· ¹× »ï¿ø°è ¹Ú¸·ÀÇ ÁõÂø¿¡ ÀûÇÕÇÑ °í±Þ Á¦¾î
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ALD Systems ComparisonCompare ALD equipment and systems manufacturedAnric Technologies. Compare by size and capability. |
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AT200M |
AT410M/610/810 |
AT650T |
AT650P |
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Desktop (W: ~11¡± (27.9cm) x D: 15¡± (38.1cm) x H: 14.5¡± (36.8cm)) | Desktop (W: 24.5¡± (62.3cm) x D: 24¡± (61cm) x H: 15.75¡± (40.5cm))[610 D: 25¡È (63.5cm)] | Desktop (W: 15¡± (38.1cm) x D: 15¡± (38.1cm) x H: Less that 38¡± (96.5cm)) | Desktop (W: 15¡± (38.1cm) x D: 15¡± (38.1cm) x H: 38¡± (96.5cm)) | |||||
Sample Size = 2 inch (x2) up to 2 x 2 x 2¡± volume | 410 = 4 inch; 610 = 6 inch; 810 = 8 inch | 6 inch | 6 inch | |||||
Thermal to 300¡ÆC | Thermal to 320¡ÆC | Thermal to 400¡ÆC (upgradeable to Plasma) |
Plasma and Thermal to 400¡ÆC |
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One Precursor/One Counter Reactant |
Three Precursors/ Up to Three Counter Reactants |
Four Precursors/Four Counter Reactants |
Four Precursors/Four Counter Reactants |
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Heated Precursor to 150¡ÆC | Heated Precursor to 180¡ÆC (N2 Assist Available) | 3 Precursors to 185¡ÆC (with optional pressure boost) , 1 at RT | 3 Precursors to 185¡ÆC (with optional pressure boost) , 1 at RT | |||||
All stainless steel chamber and metal sealed stainless lines | All aluminum chamber (hot walled) and metal sealed stainless lines | All aluminum chamber (warm walled) and metal sealed stainless lines and chuck | All aluminum chamber (warm walled) and metal sealed stainless lines and chuck | |||||
Heated lines and fast pulsing ALD valves | Heated lines and fast pulsing ALD valves | Heated lines and fast pulsing ALD valves | Heated lines and fast pulsing ALD valves | |||||
Ultrafast MFC | Ultrafast MFC | Up to four ultrafast MFCs | Up to four ultrafast MFCs | |||||
5¡± Display w. Integrated PLC |
7¡° Display with integrated PLC |
10¡° Display with integrated PLC |
10¡° Display with integrated PLC |
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±¹Á¦ À¯Åë´ÜÁö 17µ¿ 127È£ Contact us :contrabase26@gmail.com jsi@jsits.com |
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