ALD (Atomic Layer Deposition)
 
               
 

ALD systems and equipment for research to pilot lines, from thermal ALD equipment to plasma ALD equipment.
Shop by size and capability, or compare our systems using the button below.


 
           
           
               
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AT200M
AT410
AT650P
AT650T
AT-OZONE Generator
AT610
AT810

 

             
 

AT-OZONE Generator

¿ÀÁ¸, »ê¼Ò ¹× ²¨Áü À§Ä¡ °£ ¼öµ¿ ¶Ç´Â ÀÚµ¿ Àüȯ.

¿ÀÁ¸ »ý¼º ¹üÀ§: ÀúÀ¯·®¿¡¼­ Áß·® ±âÁØ 12%, °íÀ¯·®¿¡¼­ 6%.
ÅëÇÕ O 2 Á¶Àý±â: 3 ? 29psi
ºñÁֱ⠿ÀÁ¸ È帧À» À§ÇÑ °í¿ë·® ¿ÀÁ¸ Æı«±â
3~24V ÀÔ·Â ½ÅÈ£·Î Á¦¾î °¡´É
¼öµ¿ ¿ÀÁ¸ Á¦¾î¿ë ¿À¹ö¶óÀÌµå ½ºÀ§Ä¡
O 2 ¶Ç´Â ¿ÀÁ¸ Ãâ·Â ¼±ÅÃÀ» À§ÇÑ Àü¸é ÆгΠ½ºÀ§Ä¡

 

 

AT-OZONE Generator

     
ATOzone(¿ÀÁ¸ ¹ß»ý±â) ½Ã½ºÅÛÀº ¸Å¿ì ÀÛÀº ÇüÅ·Π°í³óµµ(ÃÖ´ë 12%) ¿ÀÁ¸À» Àü´ÞÇÏ´Â °íÇ°Áú ±¸¼º ¿ä¼Ò¸¦ »ç¿ëÇÕ´Ï´Ù. ÀÌ ½Ã½ºÅÛÀº ºñ½Î°í ºÎÇÇ°¡ Å« ¼ö³Ã½ÄÀ» ÇÊ¿ä·Î ÇÏÁö ¾Ê½À´Ï´Ù. ³»ÀåµÈ °í¼Ó ÆÒÀº Àå±â°£ ¶Ç´Â Áö¼ÓÀûÀ¸·Î »ç¿ëÇÏ´Â µ¿¾È¿¡µµ ÇöóÁ ¼¿À» ½Ã¿øÇÏ°Ô À¯ÁöÇÕ´Ï´Ù.
     
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¿ÀÁ¸ »ý¼º ¹üÀ§: ÀúÀ¯·®¿¡¼­ Áß·® ±âÁØ 12%, °íÀ¯·®¿¡¼­ 6%.
ÅëÇÕ O 2 Á¶Àý±â: 3 ? 29psi
ºñÁֱ⠿ÀÁ¸ È帧À» À§ÇÑ °í¿ë·® ¿ÀÁ¸ Æı«±â
3~24V ÀÔ·Â ½ÅÈ£·Î Á¦¾î °¡´É
¼öµ¿ ¿ÀÁ¸ Á¦¾î¿ë ¿À¹ö¶óÀÌµå ½ºÀ§Ä¡
O 2 ¶Ç´Â ¿ÀÁ¸ Ãâ·Â ¼±ÅÃÀ» À§ÇÑ Àü¸é ÆгΠ½ºÀ§Ä¡

Àåºñ ½ºÆå
¿ÀÁ¸ »ý¼º ¹üÀ§: ÀúÀ¯·®(250sccm)¿¡¼­ Áß·® ±âÁØ 12% ~ °íÀ¯·®(2500sccm)¿¡¼­ 6%
¼¼¶ó¹Í À¯Àüü°¡ Æ÷ÇÔµÈ ¾Ë·ç¹Ì´½À¸·Î ¸¸µç Äڷγª ¼¿
ÀÛµ¿ ÁÖÆļö: 5,000 ? 30,000Hz
»ê¼Ò/¿ÀÁ¸ À¯·® ¹üÀ§: 25 ? 2500sccm(ÆгΠÅëÇÕ À¯·® Á¦¾î Æ÷ÇÔ)
ÅëÇÕ O 2 Á¶Àý±â: 3-29psi ¹üÀ§
ÀÚµ¿ ¿ÀÁ¸ Á¦¾î¿¡ ÇÊ¿äÇÑ 3-24V DC ÀÔ·Â ½ÅÈ£
110~220VAC, 60/50Hz, 2A
¹«°Ô 15ÆÄ¿îµå
Å©±â: 10.3" W x 7.5" H x 20" D
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AT ½Ã¸®Áî ½Ã½ºÅÛ°ú ¸ð´ÏÅ͸µ ¹× ÅëÇÕ
ÃÖ´ë 5000ppb ¶Ç´Â 5ppm±îÁö °¨Áö
³ì»ö: ¿ÀÁ¸ ¼öÁØÀÌ 1500ppb ¹Ì¸¸ÀÔ´Ï´Ù.
³ë¶õ»ö: ¿ÀÁ¸ ¼öÁØ 1500ppb ~ 3500ppb
»¡°£»ö: ¿ÀÁ¸ ¼öÁØÀÌ 3500ppbº¸´Ù Å­
ÁÖº¯ ¿ÀÁ¸°¡½º ½Ç½Ã°£ °¨Áö
¿Âµµ ¹× ½Àµµ °¨Áö
LCD µð½ºÇ÷¹À̸¦ °®Ãá º®°ÉÀÌ
¿ÀÁ¸ ¹ß»ý±â¸¦ Á¦¾îÇϱâ À§ÇÑ ¿Â/¿ÀÇÁ °Ç½Ä Á¢Á¡ ¸±·¹ÀÌ Ãâ·Â 1°³ Á¦°ø
ÀÚµ¿ Â÷´ÜÀ» À§ÇØ ¿ÀÁ¸ ¹ß»ý±â¿¡ »çÀü ¹è¼±µÇ¾î Á¦°øµË´Ï´Ù.

¼³Ä¡½Ã ÂüÁ¶»çÇ×
Á¤È®ÇÑ ¼¼ºÎ »çÇ×°ú Ãß°¡ ¾ÈÀü ¿¹¹æ Á¶Ä¡´Â ATOzone ? ¼³Ä¡ ¹× ÀÛµ¿ ¸Å´º¾óÀ» ÂüÁ¶ÇϽʽÿÀ.
Èĸé ÀÔ·Â Æ©ºê(1/4¡È Swagelok ¾ÐÃà ÇÇÆÃ)¿¡ 98% ÀÌ»óÀÇ »ê¼Ò °ø±Þ ±ÇÀå(¼øµµ 90% ÀÌ»ó ÇÊ¿ä)
0.5 scfhÀÇ ¼ø¼ö O2¸¦ ÀûÀýÇÑ ¿Á»ó ¹è±â ÀåÄ¡ ¶Ç´Â ÀÌ¿¡ »óÀÀÇÏ´Â ÀåÄ¡·Î ó¸®ÇÒ ¼ö ÀÖ´Â ¹è±â Æ÷Æ®(1/4¡È Swagelok ¾ÐÃà ÇÇÆÃ).
¿ÀÁ¸Àº Àü¸é Æ÷Æ®(1/4¡È Swagelok ¾ÐÃà ÇÇÆÃ)¿¡¼­ ³ª¿À¸ç ALD µµ±¸(¶ÇÇÑ ÀûÀýÇÏ°Ô ¹è±âµÊ)¿¡ ¿¬°áµÇ¾î¾ß ÇÕ´Ï´Ù.
Èĸ鿡 Àü¿ø ÄÉÀ̺íÀ» ¿¬°áÇÕ´Ï´Ù(Ç¥ÁØ 110-220VAC).
Àü¸éÀÇ (O2) ¾Ð·Â ¹ëºê¸¦ 15psi·Î µ¹¸®°í 0.2~0.4scfh·Î ÃøÁ¤ÇÕ´Ï´Ù.
ÀÌÁ¦ Àü¸é ½ºÀ§Ä¡°¡ O3(¿ÀÁ¸)¿¡ À§Ä¡ÇØ¾ß ÇÕ´Ï´Ù.
¸ðµç ¿¬°áÀÌ ÀÌ¹Ì ÀÌ·ç¾îÁø °æ¿ì + 3~24V Á¦¾î ½ÅÈ£°¡ ÁÖ¾îÁö¸é O2 È帧À» Á¦¾îÇϴ¹ëºê°¡ ¿­¸³´Ï´Ù(¿ÀÁ¸ÀÌ »ý¼ºµË´Ï´Ù). ¹è±â ÀåÄ¡°¡ Á¦´ë·Î ¿¬°áµÇ¾î ÀÖ´ÂÁö ¹Ì¸® È®ÀÎÇϼ¼¿ä! ¾ðÁ¦µçÁö ¹æÀ¸·Î ÁöÄ¡Áö ¸¶½Ê½Ã¿À.
µÞ¸éÀÇ »¡°£»ö º¸È£ ÀåÄ¡¸¦ µé¾î¿Ã¸®°í ¼öµ¿ ¿ÀÁ¸ ½ºÀ§Ä¡¸¦ À§·Î ¿Ã·Áµµ ¿ÀÁ¸ÀÌ »ý¼ºµÉ ¼ö ÀÖ½À´Ï´Ù .
ÀÌÁ¦ Àü¸é ÆгΠ¿ÀÁ¸ ½ºÀ§Ä¡(O3)¸¦ ÄÑ¸é ¿ÀÁ¸ÀÌ Àü¸é Æ÷Æ®(Á¦´ë·Î ¹è±âµÈ ALD µµ±¸·Î)·Î º¸³»Áý´Ï´Ù.
µÞ¸éÀÇ º¸È£ Ç÷¦À» ´ÝÀ¸¸é ¿ÀÁ¸ÀÌ Â÷´ÜµË´Ï´Ù.
Áø°ø ½Ã½ºÅÛ¿¡ ¿¬°áÇÒ ¶§ ½Ã½ºÅÛ¿¡ È帣´Â »ê¼ÒÀÇ ¾ç¾ÐÀ» Ç×»ó À¯ÁöÇϽʽÿÀ. ATOzone ½Ã½ºÅÛÀ» Áø°ø û¼Ò±â·Î û¼ÒÇÏ¸é º¸ÁõÀÌ ¹«È¿È­µË´Ï´Ù .
¼ÒÇÁÆ®¿þ¾î

ÀÚ¼¼ÇÑ ÁöħÀº ÇÁ·¹Á¨Å×ÀÌ¼Ç ¹× ºñµð¿À ÁöħÀÎ " AT650T ¼³Ä¡ ¹× ½ÃÀÛ " À» ÂüÁ¶ÇϽʽÿÀ.

10ÀÎÄ¡ ÅÍÄ¡ ½ºÅ©¸°
ÆгÎÀ» °®Ãá HMI(Human Machine Interface) PLC ½Ã½ºÅÛ

Ç¥ÁØ ALD »çÀÌŬ Àº ¹°·Ð ³ª³ë¶ó¹Ì³×ÀÌÆ®, µµÇÎµÈ ¹Ú¸· ¹× »ï¿ø°è ¹Ú¸·ÀÇ ÁõÂø¿¡ ÀûÇÕÇÑ °í±Þ Á¦¾î
°íÇ°ÁúÀÇ Å×½ºÆ®µÈ ÇÁ·Î¼¼½º¸¦ À§ÇÑ ·¹½ÃÇÇ µ¥ÀÌÅͺ£À̽º
¸ÂÃã ·¹½ÃÇÇ ÀÔ·Â È­¸é
°øÁ¤»óÅ ½Ç½Ã°£ Ç¥½Ã
°³º°ÀûÀ¸·Î ÇÁ·Î±×·¡¹Ö °¡´ÉÇÑ °¡¿­¿ø ¿Âµµ
3¿ø È­ÇÕ¹° ¹× ³ª³ë ÀûÃþü¸¦ À§ÇÑ ³»ÀåÇü ÆÞ½º ½ÃÄö½º
°£´ÜÇÑ Áú¹®À¸·Î ºü¸£°Ô ½ÇÇàÇÏ¿© »ç¿ëÀÚ¸¦ À¯µµÇÕ´Ï´Ù.
ÀÔ·Â ÇÏÀ§ ÁÖ±â ¹× Àüü ÁÖ±â

 

 

 

 

                 
 

ALD Systems Comparison

Compare ALD equipment and systems manufacturedAnric Technologies. Compare by size and capability.

 
                 
 
AT200M
AT410M/610/810
AT650T
AT650P
 
 
 
  Desktop (W: ~11¡± (27.9cm) x D: 15¡± (38.1cm) x H: 14.5¡± (36.8cm))   Desktop (W: 24.5¡± (62.3cm) x D: 24¡± (61cm) x H: 15.75¡± (40.5cm))[610 D: 25¡È (63.5cm)]   Desktop (W: 15¡± (38.1cm) x D: 15¡± (38.1cm) x H: Less that 38¡± (96.5cm))   Desktop (W: 15¡± (38.1cm) x D: 15¡± (38.1cm) x H: 38¡± (96.5cm))  
  Sample Size = 2 inch (x2) up to 2 x 2 x 2¡± volume   410 = 4 inch; 610 = 6 inch; 810 = 8 inch   6 inch   6 inch  
  Thermal to 300¡ÆC   Thermal to 320¡ÆC   Thermal to 400¡ÆC
(upgradeable to Plasma)
  Plasma and Thermal to
400¡ÆC
 
  One Precursor/One Counter
Reactant
  Three Precursors/ Up to Three Counter
Reactants
  Four Precursors/Four
Counter Reactants
  Four Precursors/Four
Counter Reactants
 
  Heated Precursor to 150¡ÆC   Heated Precursor to 180¡ÆC (N2 Assist Available)   3 Precursors to 185¡ÆC (with optional pressure boost) , 1 at RT   3 Precursors to 185¡ÆC (with optional pressure boost) , 1 at RT  
  All stainless steel chamber and metal sealed stainless lines   All aluminum chamber (hot walled) and metal sealed stainless lines   All aluminum chamber (warm walled) and metal sealed stainless lines and chuck   All aluminum chamber (warm walled) and metal sealed stainless lines and chuck  
  Heated lines and fast pulsing ALD valves   Heated lines and fast pulsing ALD valves   Heated lines and fast pulsing ALD valves   Heated lines and fast pulsing ALD valves  
  Ultrafast MFC   Ultrafast MFC   Up to four ultrafast MFCs   Up to four ultrafast MFCs  
  5¡± Display w. Integrated
PLC
  7¡° Display with integrated
PLC
  10¡° Display with integrated
PLC
  10¡° Display with integrated
PLC
 
                 

 

     
 

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