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su8 Photoresist for Ultrathick coating :to get uniformal 1mm thickness coating
...............................................................or to make Patten with PDMS


Ultra Thick high aspect ratio

 


Encapsultion/Passivation

 


Microfluidics




The SU8 product line consists of chemically amplified; epoxy based negative resists with high functionality, high optical transparency and are sensitive to near UV radiation.
Cured films or topography are highly resistant to solvents, acids and bases and have excellent thermal stability, making it well suited for permanent use applications.

Material Attributes

SU8 2000

  • >10:1 aspect ratio imaging with vertical sidewalls.
  • <1um to >200 um in a single spin coat.
  • High chemical and plasma resistance.
  • Faster Drying Films.



   

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Tel : (031) 479-4211/2, Fa* : (031) 479-4213

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