½ºÇÉÇÁ·Î¼¼½º ½ºÅ×À̼Ç:ÄÚÆà ¹× Çö»ó¿ë ( Spin Process Station for Coating & Developing)

Fully integrated cabinet with double spin chambers for safe and clean coating & developing process

 

Compact integrated solution in single cabinet:

  • Full Ç÷¡½ºÆ½ ÇÏ¿ì¡ : 20mm Thick NPP (NPP)
  • ÀÌÁö ÇÁ·Î¼¼½º ÄÜÆ®·ÑÀÌ °¡´ÉÇÑ Åõ¸í ÇÑ ¶Ñ²±
  • DI-water and Nitrogen spray guns Located in handy position to facilitate cleaning of the chamber
  • ¾ÈÀü¼¾¼­ÀåÂø :liquid leakage and choked drain detection
  • Exhaust/presence ¸ð´ÏÅ͸µ ½Ã½ºÅÛ

Coater equipped with:

  • Fully automated dosing pump
  • Dynamic movable dispense arm with constant or Rpm related speed control for maximum uniformity among whole substrate surface
  • Front and back side adjustable Edge Bead Removal
  • Nitrogen dry :optionally available through lid or movable arm
  • Digitally controlled brushless motor with highly accurate speed control and acceleration selectable per recipe step
   

 

 

Developer equipped with:

  • Fully automated top spray developing system with double contained lines
  • HD drive suitable for chemical saver “puddle” developing
  • Developer dispensed through dispense vessel
  • Substrate Front & Back Side In Situ Di Water Rinse with manually adjustable flow rate
  • Combined chamber rinse and purge system for safe access to process chamber
  • Selectable drain line with integrated drain canister for waste collecting

See also our other models:

Cleaning

Etching

 

Spin Process Station
 
Shop » Models » StationsÅ©¸®´× & µå¶óÀÌ¿ë ½ºÇÉÇÁ·Î¼¼¼­


  • Drying
  • Rinse/clean
  • Etching
  • Manual coating
  • Automatic coating
  • Developing

재성ITS co. Korea     Tel:031-479-4211/2   Fax:031-479-4213
jsi@jsits.com
안양시 동안구 호계동 555-9 국제유통상가,17동 127호